X射線繞射學

臺北科技大學 115-1 學期課程,課號 365920。

課程大綱

本課程介紹X射線特性、繞射原理及X射線繞射在材料科學上之應用。內容包括X射線之產生,X射線之性質,X射線之繞射理論,材料之晶體結構與繞射條件。在X射線繞射方法方面則介紹Laue照相法,粉末法,繞射儀及光譜儀等。應用方面則包括晶體結構之鑑定,晶格常數之量測,相圖測定,序化一非序化轉換及化學成分分析等。 Introduction to the following topics: 1. Properties of X-Ray 2. Geometry of Crystals 3. Principles of X-Ray Diffraction 4. Experimental Methods (Diffractometer Measurements, Powder Photographs, and Laue Photographs) 5. Applications of X-ray Diffraction on Materials Science (Orientation and Quality of Single Crystal, Determine of Crystal Structure and Precise Parameter Measurements, Chemical Analysis, Phase Transformations etc.)

課程進度

週次 單元主題 1 Properties and Production of X-rays 2 Properties and Production of X-rays 3 Geometry of Crystals 4 Geometry of Crystals 5 Projections of Crystals 6 Projections of Crystals 7 Elements of Diffraction Theory 8 期中考試 9 Elements of Diffraction Theory 10 Elements of Diffraction Theory 11 Laue Photographs 12 Powder Photographs 13 Powder Photographs 14 Diffractometer Methods 15 Applications of X-ray Diffraction 16 期末考試

評量方式

期中考試 40% 期末考試 40% 課堂表現 10% 彈性學習 10%

教材

【遵守智慧財產權觀念,請使用正版教科書,不得使用非法影印教科書】 使用外文原文書:是 Text: ”Elements of X-Ray Diffraction” 3rd ed. B. D. Cullity and S.R. Stock, 2001