鍍膜工程

臺北科技大學 115-1 學期課程，課號 363531。

課程大綱

本課程旨在介紹薄膜材料與氣相沉積技術之基本原理、製程方法及工程應用。課程內容首先回顧材料科學基本概念，接續探討氣相沉積技術中的氣體傳輸、吸附、脫附、表面擴散及薄膜成長機制等核心理論，並介紹真空科學相關知識。課程介紹之製程技術涵蓋物理氣相沉積（PVD）與化學氣相沉積（CVD）之原理與應用，包括電阻式加熱蒸鍍、電子束蒸鍍、雷射蒸鍍、分子束磊晶成長與濺鍍技術，及各類化學氣相沉積製程與成長動力學。 This course aims to introduce the fundamental principles, processing methods, and engineering applications of thin-film materials and vapor deposition technologies. The course begins with a review of the basic concepts of materials science, followed by discussions of the core theories underlying vapor deposition processes, including gas transport, adsorption, desorption, surface diffusion, and thin-film growth mechanisms, as well as relevant concepts in vacuum science. The processing technologies covered in this course include the principles and applications of physical vapor deposition (PVD) and chemical vapor deposition (CVD). Topics include resistance heating evaporation, electron-beam evaporation, laser deposition, molecular beam epitaxy (MBE), sputtering technology, and various chemical vapor deposition processes and their growth kinetics.

課程進度

第1週 09/09 課程內容簡介 Introduction of the subject 第2週 09/16 材料科學回顧 Review of Materials Science 第3週 09/23 材料科學回顧 Review of Materials Science 第4週 09/30 氣相沉積技術原理(氣體傳輸、吸附、脫附、表面擴散、膜層成長機制) Principal of Vapor Phase Deposition Process (Gas transportation, absorption, desorption, surface diffusion, growth mode) 第5週 10/07 氣相沉積技術原理(氣體傳輸、吸附、脫附、表面擴散、膜層成長機制) Principal of Vapor Phase Deposition Process (Gas transportation, absorption, desorption, surface diffusion, growth mode) 第6週 10/14 真空科學(氣體動力學、壓力、氣體/固體兩相界面、氣體輸送、流導、抽氣速率) Vacuum Science (Kinetic theory of gases, pressure, gas impingement on surfaces, gas transport & pumping, conductance, pumping speed) 第7週 10/21 物理氣相沉積(1) (真空系統、電阻式加熱、電子束蒸鍍、雷射蒸鍍) Physical vapor deposition (1) (Vacuum system, resistive heating, electron-beam heating, laser evaporation) 第8週 10/28 物理氣相沉積(1) (真空系統、電阻式加熱、電子束蒸鍍、雷射蒸鍍) Physical vapor deposition (1) (Vacuum system, resistive heating, electron-beam heating, laser evaporation) 第9週 11/04 期中考Middle examination 第10週 11/11 物理氣相沉積(2) (分子束磊晶成長、濺鍍) Physical vapor deposition (2) (Molecular beam epitaxy) 第11週 11/18 物理氣相沉積(2) (分子束磊晶成長、濺鍍) Physical vapor deposition (2) (Molecular beam epitaxy) 第12週 11/25 化學氣相沉積(1) (反應階段、常見反應型式、氣體傳輸、反應機制、成長動力學) Chemical vapor deposition (Reaction procedure, common reaction types, gas transportation, reaction mechanism, growth kinetics) 第13週 12/02 期末報告 (Final report) 第14週 12/09 期末報告 (Final report) 第15週 12/16 期末報告 (Final report) 第16週 12/23 期末考 Final exam 第17週 12/30 化學氣相沉積(2) (CVD種類) Chemical vapor deposition (CVD types) 第18週 01/06 化學氣相沉積(2) (CVD種類) Chemical vapor deposition (CVD types)

評量方式

1.Participation 出席成績 (20%) 2.Presentation 發表 (20%) 3.Middle examination 期中考 (30%) 4.Final examination 期末考 (30%)

教材

【遵守智慧財產權觀念，請使用正版教科書，不得使用非法影印教科書】 使用外文原文書：是 1.Handbook of Thin Film Deposition Processes and Techniques, K. Seshan, William Andrew Publishing (2002). 2.The Materials Science of Thin Films, M. Ohring, Academic Press (1991)